在几种不同材料的试件表面刻蚀出了试件栅，这种技术的实现使云纹干涉法和精细网格法在高温高压环境下的广泛应用成为可能。
The realization of this teChnique makes it possible to apply the Moire interferometry and lattice method under high-temperature, high-pressure environments.
金属极板还被深度刻蚀，从而极大地扩展了其表面的面积。
The metal plate is also deeply etched so as greatly to increase its surface area.
介绍了在已有铬层上补镀硬铬的方法，强调了补镀前表面净洁、反电刻蚀(阳极处理)、低电压小电流起镀等工艺的重要性及应注意的问题。
The importance of surface cleaning before replating, reverse electro-etching (anodic treatment) as well as low-voltage and small-current plating, and some problems needing attention were emphasized.
在处理完成和裂缝闭合时，刻蚀后的表面提供了从储层至井筒的高导流能力的通道。
When the treatment is complete and the fracture closes, the etched surface provides a high-conductivity path from the reservoir to the wellbore.
对液相中的激光表面处理-激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed. The principle and application of this technique were described.
YG8硬质合金经稀硝酸水溶液化学侵蚀后，表面一定深度内的粘结相钴将被化学刻蚀掉，引起表层疏松。
Cobalt phase was chemically etched to certain depth beneath the surface and porous layer was formed after YG8 cemented carbide had been soaked in aqueous solution of dilute nitric acid.
本文作者认为等离子体轰击高聚物表面引起的局部高温是离子刻蚀后试样表面出现伪迹的重要原因。
The authors think that the high temperature on polymer local surface produced by ion bombardment is the main cause of artifacts on sample surface treated by ion-etching.
在薄膜沉积和离子束刻蚀技术中，通常要给绝缘基片加上一个射频或脉冲电极，以便在绝缘基片上形成一个自偏压来控制轰击到绝缘基片表面的离子能量。
Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.
对液相中的激光表面处理-激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed.
并用几何图形描述了石墨圆筒表面上刻蚀轨迹的几种情况。
A number of traces etched on the surface of graphite pot are described diagrammatically.
由于多晶硅回刻蚀至比整个器件的硅的表面低，通常不再需要多晶硅掩模，从而节省了制造成本。
Since the polysilicon is etched back below the top surface of the silicon throughout the device, there is normally no need for a polysilicon mask, thereby saving fabrication costs.
在鞘层内存在大量高能离子，除表面反应外，离子还能对粉粒表面进行刻蚀，因此钝化效应将消失。
There were a lot of high energy ions in the sheath area, beside the surface reactions, the surface of particulates could be etched by the ions, and the passivation effect would be eliminated.
目的：对激光和磷酸刻蚀牙釉质进行比较，探讨激光刻蚀是否可作为酸蚀牙釉质表面的一种替代方法。
Objective: to compare phosphoric acid etched and laser etched human enamel surfaces and evaluate the possibility of using laser etching as a new technique to take place the conventional acid etching.
研究结果表明，低温等离子体表面改性处理能够刻蚀牦牛毛纤维表面的鳞片，而且空气等离子体的刻蚀效果优于氧等离子体的刻蚀效果；
The results reflect that treated by low temperature plasma processing the surface squama of yak hair is etched and the effect of air plasma is better than that of oxygen plasma.
结果表明：空气氧化处理碳纤维表面形成微孔和刻蚀沟槽，容易形成应力集中，复合材料的强度不高；
Gas-phase oxidation treatment resulted in distrihution of some micro-pores and ditches at the carbon fiber surface and led to stress concentration therefore, the composite strength was not high.
本文采用X光电子能谱加氩离子刻蚀法，测出三种分散剂在煤表面吸附膜的近似厚度。
The thickness of absorbed films was measured for three CWM dispersants by X-rayphotoelectric spectrometer and argon-ion etching in this report.
利用牺牲氧化改善刻蚀后的表面形貌，进一步减小表面的刻蚀损伤。
In this study sacrificial oxidation is used as a post-etch treatment to reduce surface roughness and etch damage.
电池片表面无划伤，但对于在制作过程中采用激光刻蚀工艺的电池的边沿刻蚀线除外。
No scratch allowed, with exception of laser scratched lines for the cells fabricated with laser for edge isolation.
本文提出了一种基于“沾笔”纳米刻蚀和电化学还原技术在表面上制备金属及半导体纳米结构的普适性方法。
A general approach for fabricating metallic and semiconducting nanostructures has been developed based on "dip pen" nanolithography combined with electrochemical reduction of water soluble salts.
结果表明，氨等离子处理会对膜表面产生一定的刻蚀作用，从而影响膜表面的粗糙度及氨基接枝密度；
The results showed that plasma treatment would etch film surface, which would affect the roughness of film surface and the density of grafted ammonia group.
提出一种基于等离子体刻蚀的技术，形成减反射表面结构。
A technology based on plasma etching has been developed to produce antireflective surface structures.
本文对比了用氩等离子体和氧等离子体预刻蚀电极的情况，认为在电极表面是否有含氧基团存在对氩等离子体聚合制备修饰电极影响不大。
The effects of etching electrode with argon and oxygen plasmas in advance on the preparation of argon plasma polymerized vinylferrocene film electrode were compared.
采用感应耦合等离子体刻蚀技术实现了不同形状和几何参数的规则织构化硅片表面的构筑与制备。
Regular textured silicon surfaces with various shape and different geometrical parameters were successfully designed and prepared using inductively coupled plasma (ICP) etching technology.
采用微波电子回旋共振等离子体反应离子刻蚀（E CR-R IE）装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave.
本发明探针诱导光刻薄膜用于探针诱导表面等离子体共振光刻将大大降低刻蚀线宽。
When the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.
最后利用三维表面形貌仪，分别对湿法刻蚀和干法刻蚀的磁头结构进行了数据分析。
The etching parameters and the photos of the head slider were presented. 3D surface microstructures of the head sliders were analyzed by Vecco MHT-III interferometer.
最后利用三维表面形貌仪，分别对湿法刻蚀和干法刻蚀的磁头结构进行了数据分析。
The etching parameters and the photos of the head slider were presented. 3D surface microstructures of the head sliders were analyzed by Vecco MHT-III interferometer.
应用推荐