讨论了入射角、入射方位角、入射光波长、光栅栅距、介质折射率与矩形光栅衍射级次数目间的关系。
The relationships between the number of diffraction order and grating pitch, refractive index of medium, light wavelength, incidence Angle and azimuth Angle are investigated.
刷新率的变化和黑栅衍射效应将导致衍射效率下降，使得曝光深度误差增加。
The variation of refresh rate and diffraction by opaque lattice will lead to reducing diffraction efficiency and this will increase exposure depth error.
对两束相干光写入稳态相位栅的衍射效率进行数值模拟，发现在某一角度范围内衍射效率有一最大值存在。
Diffraction efficiency was simulated theoretically in the stable state phase during the double coherent light coupling and a maximum value of diffraction efficiency was discovered in some Angle scope.
在国内外普遍使用的细栅距幅光栅叠栅条纹系统中，衍射效应是很明显的，这是造成叠栅条纹信号的衬比（度）和正弦性不好的主要原因。
In an amplitude grating system of small grid pitch, the diffractive light is the main cause to deteriorate the contrast and sinusoidal property of Moiré signals.
基于夫琅禾费衍射理论，推导了平行光入射变栅距光栅后衍射光强的角度分布。
On the basis of Fraunhofer diffraction theory, the diffraction patterns of a Varied Line-space (VLS) grating were obtained for incidence beam in parallel and uniform.
该方法可用于斜入射情形下具有复杂结构和任意单元截面的介质栅近场及其衍射特性分析。
The presented scheme is useful to study the diffractionproblem of dielectric gratings with arbitrary shape and complicated configuration.
采用该控制系统的光栅刻划实践表明，所设计的光电式刻划控制系统已完全达到了高密度衍射光栅的亚微米栅距分度要求。
The ruling practice using the control system shows that the photoelectric control system meets the sub-micrometer graduation requirement of high-density gratings.
采用该控制系统的光栅刻划实践表明，所设计的光电式刻划控制系统已完全达到了高密度衍射光栅的亚微米栅距分度要求。
The ruling practice using the control system shows that the photoelectric control system meets the sub-micrometer graduation requirement of high-density gratings.
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