• 较高温度下,自发成核从而限制金属诱导体生长速度。

    The nucleation and crystallization of a-Si will occ ur spontaneously at higher temperature, which will restrict the MILC. The length and thickness of Ni source also affect the...

    youdao

  • 较高温度下,自发成核从而限制金属诱导体生长速度

    The nucleation and crystallization of a-Si will occ ur spontaneously at higher temperature, which will restrict the MILC. The length and thickness of Ni source also affect the MILC growth, the...

    youdao

  • 较高温度下,自发成核从而限制金属诱导体生长速度

    The nucleation and crystallization of a-Si will occ ur spontaneously at higher temperature, which will restrict the MILC. The length and thickness of Ni source also affect the MILC growth, the...

    youdao

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