结果表明，氧化铝薄膜的沉积速率随溅射功率的增大先几乎呈线性增大而后增速趋缓；
The results show that the deposition rate firstly increases linearly and then changes little with the increase of sputtering power.
结果表明，氧化铝薄膜的沉积速率随溅射功率的增大先几乎呈线性增大而后增速趋缓；
The results show that the deposition rate firstly increases linearly and then changes little with the increase of sputtering power.
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