文中采用无源探针对由等离子弧梯度电压和等离子鞘层电压构成的等离子反翘(等离子云)电压进行检测。
A non power supply probe was developed to detect the plasma cloud voltage, which consists of plasma arc voltage gradient and plasma sheath voltage.
利用射频鞘层模型，推出了离子到达被加工材料表面时的动量的表达式。
Based on the rf (radio frequency) sheath model, the equation for ion momentum when reaching the material surface was derived.
离子被鞘层中的加速电场加速，以束流的形式注入到工件表面，而束流分布的情况与作用电压有着十分密切的关系。
Ions accelerated by the electric field in the sheath form a shape of beam and a flux distribution on the target surface, which are strongly dependent on the applied voltage.
气体放电中的各种等离子体鞘层。
本文从离子动力学方程出发，利用LB碰撞模型研究了离子-离子碰撞效应对前鞘等离子体输运的影响。
By using ion kinetic equation, the influence of ion-ion collision effects on the presheath plasma transport is taken into account through the LB collisional model.
在射频鞘层模型基础上，推出了离子轰击材料表面的速度、浓度及能量通量的表达式。
Based on the radio frequency sheath model, the equations for ion velocity, density, and energy flux colliding on the material surface are derived.
在等离子体中，鞘层在控制带电粒子向极板(或靶材)方向运动方面起着至关重要的作用。
In plasma, the sheath plays a crucial role in controlling the movement of the charged particles towards the electrodes (or the target).
当离子在鞘层运动时，考虑离子与中性原子之间的电荷交换和弹性碰撞，以及离子被尘粒的库仑散射和收集作用。
The charge exchange and elastic collision between ion and neutral atoms and the collection and Coulomb scattering of ion on dust grains are considered.
在一维平板鞘层中应用双流体模型在有无碰撞两种情况下分别研究了定向离子束和定向电子束的存在对玻姆鞘层判据的影响。
A two-fluid model has been used to study the influence of the existence of the directive ions and directive electrons on the Bohm criterion of sheath.
本文主要研究电磁波在不均匀等离子体鞘套中传播的一些近似计算方法。
In this paper, several methods of solving the problem of electromagnetic wave propagation in a inhomogeneous plasma sheath is investigated.
研究了射频鞘层中离子轰击材料表面的能量通量与等离子体浓度之间的关系。
The relationship between the ion energy flux colliding on the material surface and the plasma density is investigated.
针对以上问题，我们建立一个一维坐标空间三维速度空间的斜磁场作用下的等离子体鞘层物理模型。
In allusion to these problems, a plasma sheath model in an oblique magnetic field, which has one dimension coordinate space and three dimensions speed space, has been build.
并相应的算出了等离子体鞘层厚度及由鞘层引起的电容。
And corresponding the thickness of sheath of plasma and the capacitance caused by the sheath are calculated.
采用数值方法模拟出鞘层的瞬时厚度及极板的瞬时电位变化、鞘层内离子密度和电场强度等物理量的时空变化。
Some numerical results have been obtained for the instantaneous sheath thickness, the instantaneous voltage and the ion flux density on the substrate, etc.
当再入目标高超声速穿越大气层时，将产生等离子体鞘套和尾流，其雷达散射特性受到目标包覆等离子体参数变化的影响而产生剧烈波动。
While the reentry target passes through the earths atmosphere at ultrasonic speed, the RCS of the reentry Capsule changed violently because of the plasma sheath and wake.
在鞘层内存在大量高能离子，除表面反应外，离子还能对粉粒表面进行刻蚀，因此钝化效应将消失。
There were a lot of high energy ions in the sheath area, beside the surface reactions, the surface of particulates could be etched by the ions, and the passivation effect would be eliminated.
采用流体方程和自洽电荷变化模型研究了尘埃等离子体鞘层的玻姆判据。
The hydrodynamic-fluid model and the self-consistent dust charging model are used to investigate the Bohm criterion for the dusty plasma sheath.
进一步，研究了射频频率对极板电位、鞘层宽度、极板上入射离子的能量分布和角度分布的影响。
Furthermore, we study the effects of various rf frequency on the voltage at the electrode, the sheath width, the IED and IAD impinging on the rf-biased electrode.
用流体方法数值模拟了电子离子磁鞘和电负性磁鞘的结构，分析了鞘层的特性和磁场的影响。
The structure of electrostatic plasma magnetic sheath and electronegative plasma magnetic sheath are numerical simulated by fluid method.
在鞘层中电场的作用下，离子被源源不断地加速注入到样品表面，从而达到改善材料表面性能的目的。
Thus the ions are continuously accelerated to implant the sample surface by the change electric field of the sheath, so as to achieve to modify the surface properties.
结果表明，放电单元采用大电极间距可获得正柱区放电，正柱区的形成是正离子在阴极鞘层区不断积累将电位抬高所致。
The results show that the long electrode gap leads to the positive column which is caused by the climbing voltage on the cathode surface due to the accumulation of positive ions.
模型包括离子连续性方程、动量方程和泊松方程，特别是提出了可以自洽地决定绝缘基板表面电势、表面电荷密度和鞘层厚度关系的等效电路方程。
The equivalent circuit model gives the instantaneous relationship between the sheath thickness and the surface potential at an insulating substrate placed on the pulse-biased electrode.
本文根据LEO中等离子体温度低、密度高、德拜长度小的特点，采用薄鞘层近似，计算了离子收集电流；
On the basis of the plasma conditions in LEO. We adopt plasma thin sheath model and calculate ion collection current.
采用蒙特卡罗方法对氦直流辉光放电平板电极等离子体阴极鞘层内电子的输运过程进行了研究。
The electron transport process in cathode sheath of helium dc glow discharge is studied by using Monte Carlo simulation.
原子谱线和离子谱线特性分析表明，在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度。
It was shown that the ion density is higher and the electron temperature is lower in the vicinity of inductively coupled plasma sheath according to the ionic line and atomic line.
当等离子体密度较高、注入电压较低时，稳态鞘层厚度对于靶体半径的变化极不敏感。
For a high plasma density and low applied voltage, the steady-state sheath thickness is more or less insensitive to variations in the spherical radius, but it is very sensitive under other conditions.
当等离子体密度较高、注入电压较低时，稳态鞘层厚度对于靶体半径的变化极不敏感。
For a high plasma density and low applied voltage, the steady-state sheath thickness is more or less insensitive to variations in the spherical radius, but it is very sensitive under other conditions.
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