一些处理参数会导致在硼化物层上形成硼-碳层，它将起着扩散垒的作用，阻止了硼化物进一步的生长。
Some treatment parameters led to boron carbon coating above the boride layer which ACTS as a diffusion barrier and prevents a further growth of the boride layer.
其中活性硼原子对渗层生长速率的贡献大于气态硼化物分解的硼原子。
It is proved that the activated boron atoms decomposed by boriding medium are more than those decomposed by gaseous boride.
微波场下的渗硼层形成所需的硼原子来源于介质分解的活性硼原子和气态硼化物分解的硼原子。
The activated boron atoms come from the boron atoms which decomposed by boriding medium and gaseous boride.
结果表明：在给定实验条件下，渗硼层组织致密，硼化物呈针齿状楔入基体，与基体结合牢固；
The results show that, in the given conditions, the microstructure of boronizing layer is dense, boride wedged base in the shape of spider, which combines with base firmly;
结果表明：在给定实验条件下，渗硼层组织致密，硼化物呈针齿状楔入基体，与基体结合牢固；
The results show that, in the given conditions, the microstructure of boronizing layer is dense, boride wedged base in the shape of spider, which combines with base firmly;
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