本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种阳极板及一种包括所述阳极板的溅镀装置。
The present invention relates to a kind of anode plate and its sputtering apparatus.
本发明提供一种焊接溅镀靶材以形成一大的溅镀靶材的方法。
Embodiments of the invention provide a method of welding sputtering target tiles to form a large sputtering target.
经实验结果显示其硬度与弹性模数皆会随著溅镀功的增加而增加。
The results show that the hardness and elastic modulus increase as the sputter power increases.
本发明涉及一种用于溅镀式镀膜机台的承载台，其包括：一第一载具及一中空的第二载具。
The invention relates to a bearing platform used for a sputtering type coating machine, which comprises a first bearing tool and a hollow second bearing tool.
利用本发明的阳极板溅镀dlc膜层，在基材表面边缘处不产生包覆结构，膜层不易脱落。
When the anode plate is used in sputtering DLC coating, no wrapping structures are formed in the edges of the substrate and the sputtered coating is firm with less falling off.
这是一个复杂的过程，在充满微粒子的真空环境下对产品进行离子溅镀，以在产品表面形成保护层。
It is a sophisticated process, performed under vacuum which deposits microscopic particles on the products by ion bombing or sputtering, to form a protecting coating on their surface.
这是一个复杂的过程，在充满微粒子的真空环境下对产品进行离子溅镀，以在产品表面形成保护层。
It is a sophisticated process, performed under vacuum which deposits microscopic particles on the products by ion bombing or sputtering, to form a protecting coating on their surface.
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