实验结果表明：退火后样品的薄膜电阻率显著减小，是未退火样品薄膜电阻率的3.17分之一；
The experimental results indicated that the film resistivity of the sample annealed was reduced significantly and only one 3.17 of the unannealed.
XRD结构分析显示，退火后薄膜样品的峰值强度大于未退火样品的强度，说明样品结晶度增强。
XRD structural analysis shows that peak intensity of the annealed sample is greater than that of the unannealed one which demonstrated an increase of crystallinity.
XRD结构分析显示，退火后薄膜样品的峰值强度大于未退火样品的强度，说明样品结晶度增强。
XRD structural analysis shows that peak intensity of the annealed sample is greater than that of the unannealed one which demonstrated an increase of crystallinity.
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