利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
本文利用基于虚拟仪器的朗缪尔双探针系统对电弧离子镀等离子体进行了诊断研究。
The Langmuir double probe system based on Virtual Instrument was used to diagnose arc ion plating plasmas.
并与传统的朗缪尔双探针法作比较。 两种方法测试结果颇相符合。
The results obtained have been compared with those of the classical Langmuir double probe method, being quite close to each other.
等离子体的参数通过朗缪尔双探针、多通道光谱仪等设备来进行诊断。
The parameters of the generated plasma are diagnosed by Langmuir dual probe and multi-channel optical emission spectroscopy (OES).
测量的结果表明，利用单探针测量的主等离子体边缘参数与朗缪尔四探针测量结果基本一致。
The results obtained show that radial profiles of the temperature and the density measured with the single probe are in agreement to those with a four-probe system.
测量的结果表明，利用单探针测量的主等离子体边缘参数与朗缪尔四探针测量结果基本一致。
The results obtained show that radial profiles of the temperature and the density measured with the single probe are in agreement to those with a four-probe system.
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