本文研究了不锈钢室温化学抛光液的组成和工艺参数。
The solution composition and technological parameters of chemical polishing of stainless steel at room temperature were studied.
研究由失效磷酸基抛光液直接制备纳米锥冰晶石新工艺。
A novel technology on direct preparation of nanometer chiolite from expired phosphoric acid-based polishing agent is investigated.
主要研究了适合铝及铝合金的碱性化学抛光液及抛光工艺。
This paper focuses on the study of the solution and process for alkaline chemical polishing aluminum and its alloy.
对银铜钎料化学抛光的工艺参数和抛光液组分进行了系列实验。
A series of experiments have been carried out on the technological parameters of Ag-Cu alloy electrolytic polishing and on the polishing liquid compositions.
采用本发明的抛光液抛光后，铜表面比较光滑，表面形貌较好。
After the polishing solution is adopted for polishing, the copper has smooth surface and good surface topography.
介绍了该抛光液的配制，研究了温度、基体材料对抛光效果的影响。
The effects of temperature, base materials on polishing results was studied.
抛光液的优劣主要有抛光率，平坦性以及缺陷的数量等几个参数反应。
Slurry performance for CMP can be determined by several output parameters including removal rate, global planarity and surface defect.
目前，CMP的抛光液通常使用纳米级颗粒来加速切除和优化抛光质量。
Currently, the slurries used in CMP usually contain particles at nano scale to accelerate the material remove ratio (MRR) and to optimize the planarity.
使用该抛光液还能杜绝加工过程中产生碱雾及氨气的问题，优化工 作环境。
The polishing fluid can also be used to stop the problems of generating alkaline fog and ammonia gas during the processing process and optimize the working environment.
通过实验肯定了硅单晶的化学侵蚀定向方法，找出抛光液的最佳配比及抛光时间。
Experiments are performed to confirm the chemical etching method for defining the crystallographic orientation of silicon single crystals.
研究了工件的上盘方法以及抛光压力、自转公转速度、抛光液浓度对抛光质量的影响；
The hanging methods of workpiece and the effect of intensity of pressure, concentration and speed ratio on quality of finish are studied;
本发明公开了一种化学机械抛光液，其含有溶胶型二氧化硅、速率增助剂、表面活性剂和水。
The invention discloses chemi-mechanical polishing liquid, which comprises a sol type silicon dioxide, a velocity accelerating auxiliary agent, a surfactant and water.
通过实验发现，该抛光液对各种奥氏体不锈钢的抛光处理在适宜条件下均可得到满意的抛光效果。
All kinds of austenitic stainless steels can be polished with this solution and good effect will be gained, which can be found from the experimental results.
通过实验分析，找到适合不同种类光学玻璃的抛光液类型，以有效提高抛光效率，改善抛光表面质量。
Through experiment and analysis, different types of suitable polishing solutions to improve productivity and the quality of polished surface were proposed.
开发出了弱碱性溶液中紫铜化学抛光新工艺，确定了抛光液中的光亮剂(包括缓蚀剂和表面活性剂)。
A new technology for chemical polishing of copper in weak alkaline solution has been developed and a brightener (containing corrosion inhibitor and surfactant) has been found out.
结果表明，利用螺旋振动抛光工艺，配合自制的抛光液，抛光后制品的表面具有较低的粗糙度和较好的光亮性。
The results show that by using self-made polishing agent, the polished products have low surface roughness and good brightness after spiral vibration polishing process.
分析了W -CMP的机理，抛光液对W材料表面具有化学腐蚀和机械研磨的双重作用，对抛光速率有着重要的影响。
The mechanism of W-CMP was analyzed, the slurry makes a dual function of chemical erosion and mechanical lapping, has an important influence on the polishing rate.
在抛光工艺中，抛光液的种类、抛光垫的选择、抛光压力、温度、抛光盘转速、加工时间等诸多条件都是决定抛光质量的重要因素。
Thirdly, the parameters deciding the quality in polishing process are as follows: slurry, polish pad, pressure, temperature, rotation speed, wafering time, and so on.
在三酸抛光液中加八一种组合添加剂可抑制黄烟（NO_2）放出。 组合添加剂由三种组分组成，其中一种吸收NO_2，另两种为表面活性剂。
Evolving of yellow fume NO_2 from three-acid-type polishing solution can be inhibited by addition of a combinatory additive which is composed of an absorbent of NO_2 and two surfactants.
在三酸抛光液中加八一种组合添加剂可抑制黄烟（NO_2）放出。 组合添加剂由三种组分组成，其中一种吸收NO_2，另两种为表面活性剂。
Evolving of yellow fume NO_2 from three-acid-type polishing solution can be inhibited by addition of a combinatory additive which is composed of an absorbent of NO_2 and two surfactants.
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