本发明属于微电子技术领域，具体涉及一种用标准集成电路工艺片设计的高性能叠层结构差分驱动的对称电感。
The invention belongs to the field of micro electronic technique, concretely relating to a high performance stacked differential symmetrical inductance designed by standard IC process piece.
本发明属于微电子技术领域，具体涉及一种用标准集成电路工艺片设计的高性能叠层结构差分驱动的对称电感。
The invention belongs to the field of micro electronic technique, concretely relating to a high performance stacked differential symmetrical inductance designed by standard IC process piece.
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