针对本工作的特点，论文内容主要包括：1、厚靶运动学重构。
The highlights of this thesis are as follows:1. Reconstruction for kinematics in the thick target.
仔细选取厚靶pixe计算中的各参数，编写了厚靶pixe分析程序，并与国外同类程序进行了比较、验证。
Carefully choosing the parameter and calculating method involved in analysis, a thick-target PIXE software package was compiled.
本工作针对地质样品的特点，尝试了简单、方便的厚靶制样法，并采用计算机处理技术解决了由此而引起的复杂的理论校正问题。
In this work the simple thick-target sampling technique was adopted and a micro-computer was employed for making corrections on the basis o 'f the theory.
该文通过对带铝套管的分段弹侵彻半无限钢靶的研究分析，以流体动力学和侵彻力学为基础，提出了一个分段弹垂直侵彻半无限厚靶的简化模型。
In study of the penetration of a segmented rod with aluminum carrier tube into semi infinite steel target, we present a simplified model of based on hydrodynamics and penetrating mechanics.
研究结果表明，随着靶基距的增加，膜厚均匀性逐渐变好。
The results showed that the thickness uniformity becomes better along with the increasing target-substrate distance.
与常规的圆柱形磁控溅射靶相比较，该旋转式靶提高了靶材利用率和膜厚均匀度。
This revolving target improved on the usage of target material and uniformity of film thickness comparing with conventional cylindric magnetron sputtering target.
在实验中采用了薄靶厚衬底新方法。
The method of thin target with thick substrate was used in the experiment.
探讨了激光诱导压力波的传播规律，预测了不同靶厚下的层裂厚度及其对层裂开始时间的影响。
The propagation of laser-induced stress wave is also further investigated, and the influences of film thickness on spall thickness as well as the time when spallation begins are predicted.
脑转移侵及脑膜可见脑膜增厚或类似“靶征”或“鼠尾征”。
Meningeal thicking or just like "target sign" or "tail of mouse sign" were found after cerebral metastasis invaded neighbour meninges.
采用计算机计算了基片处于不同靶-基距时，膜厚均匀性的分布。
Based on it, some expressions of thickness uniformity were discussed, with the distribution of thickness uniformity calculated at different target-substrate distances.
结果表明，膜厚分布的计算值与实测值符合的很好，并比较了不同气压、靶片距对淀积粒子能量和入射角分布的影响。
The simulation result of thickness distribution is in keeping with the measurement. The effects of sputtering condition on the distribution of thickness, energy and incident angle are also studied.
结果表明，膜厚分布的计算值与实测值符合的很好，并比较了不同气压、靶片距对淀积粒子能量和入射角分布的影响。
The simulation result of thickness distribution is in keeping with the measurement. The effects of sputtering condition on the distribution of thickness, energy and incident angle are also studied.
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