本发明延伸至半导体光催化剂在底漆组合物中作为面涂层对底漆层的附着促进剂或者作为底漆层对面涂层的分层抑制剂的用途。
The invention extends to the use of a semiconductor photocatalyst as a top-coat to primer adhesion promoter or as a primer to top-coat delamination inhibitor in a primer coating composition.
本文在大电机定子空心导体分层的基础上，推导了导体交流电阻的数值计算公式。
On the basis of stator hollow conductor layer building in large electric machines, the paper deduces numerical formula for calculating conductor alternating current resistance.
本文在大电机定子空心导体分层的基础上，推导了导体交流电阻的数值计算公式。
On the basis of stator hollow conductor layer building in large electric machines, the paper deduces numerical formula for calculating conductor alternating current resistance.
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