屏蔽层的导电率是由连同半导电层所采用的金属带或线的截面积和电阻率所决定的。
Shielding layer conductivity is made together with the semiconductive layer adopts metal strip or wire cross-sectional area and the resistivity is determined by the.
这些金属的导电率都不及铜高。
研究了硅衬底导电率变化对金属绝缘半导体传输线的分布电阻和分布电感参数的影响。
Examples are given to illustrate that the change of silicon substrate conductivity affects distributed parameters of MIS transmission line.
研究了硅衬底导电率变化对金属绝缘半导体传输线的分布电阻和分布电感参数的影响。
Examples are given to illustrate that the change of silicon substrate conductivity affects distributed parameters of MIS transmission line.
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