平行膜面方向为易磁化方向。
增大电流密度,沉积层沿(111)易磁化晶面方向优先生长趋势减弱,矫顽力和剩磁均增大。
Coercive force and remanence increases while current density increases, because it become weaker at (111) magnetization orientation of deposits.
研究了倾斜溅射工艺对薄膜磁性能的影响,观察到随溅射夹角的增加,薄膜易磁化轴方向转向于平行膜面方向。
The easy direction of magnetization is affected by deposition angles and is found to be paralleled to the substrate with raising deposition angles.
研究了倾斜溅射工艺对薄膜磁性能的影响,观察到随溅射夹角的增加,薄膜易磁化轴方向转向于平行膜面方向。
The easy direction of magnetization is affected by deposition angles and is found to be paralleled to the substrate with raising deposition angles.
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