这也解释了为什么很少发现古代卡利斯雕刻工具。
It also explains why few ancient Kalinese sculpting tools have been found.
我亲自到王宫市场去找的那儿最好的刻工，亲自看着他刻版。
I have been myself to the best engraver of the Palais Royal, who did the plate in my presence.
这包括来自全国各地以及伊朗、中亚的石匠、石工、雕刻工、镶嵌者、书法家、画家及其他的人才。
The masons, stonecutters, carvers, inlayers, calligraphers, painters and others were brought from the entire empire as well as from Iran and Central Asia.
城市以水渠与岩石雕刻工程而闻名，其中包括“代依尔”修道院，一座未完工的陵墓正面外观，它在拜占庭时期被用作教堂。
The city is famous for water tunnels and stone structures carved in the rock, including Ad-Dayr, “the Monastery,” an uncompleted tomb facade that served as a church during Byzantine times.
该牺牲层是通过例如化学机械平面化的蚀刻工艺除去的。
The sacrificial layer is removed through an etching process such as chemical mechanical planarization.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
片刻工夫他就挤过篱笆，站在了他院子外面的深深的草丛中。
In a minute he had squeezed through the fence and was standing in the long grass outside his yard.
可以各种方式来增加蚀刻工艺的效率，且可降低蚀刻工艺的成本。
The efficiency of the etching process may be increased in various ways, and the cost of an etching process may be decreased.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
采用双面对准光刻工艺，各向异性腐蚀微机械加工制硅膜片等新技术。
Some new techniques are adopted, for example, technology of dual-face alignmental silicon etching and anisotropic corrosion (micromachine), etc.
关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。
One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.
表面微机械加工使用选择的材料和干法和湿法蚀刻工艺以形成电路层。
Surface micromachining USES select materials and both wet and dry etching processes to form the circuitry layers.
厦门博苑工贸有限公司2002年创办，专业从事各类石材雕刻工艺。
Xiamen Boyuan trading Ltd was established in 2002. It is specially engaged in all kinds of stone carving arts.
另外，本方法也与成熟的光刻工艺兼容，降低了成本，有利于工业生产。
In addition, the method is compatible with the matured photoetching process, thereby reducing the cost and being beneficial to industrial production.
还可针对特定蚀刻工艺将所述蚀刻剂或所蚀刻的层中的任一者或两者优化。
Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.
对模具激光蚀刻工艺参数进行了优化；并设计了塑料产品常见的蚀纹图案。
The laser texturing parameter had been optimized, and the common texture figure of plastic product was designed.
本发明提供一外延沉积工艺，其包含干式蚀刻工艺与后续的外延沉积工艺。
An epitaxial deposition process including a dry etch process, followed by an epitaxial deposition process is disclosed.
针对热压印光刻工艺中因热变形而导致精度丧失的问题，提出了冷压印光刻。
Aiming at the lost accuracy happened in HEL (hot embossing lithography) because of thermal distortion, room-temperature imprint lithography is proposed.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
用硅光刻工艺和二氧化硅湿法腐蚀工艺制作了针状封装结构的光纤消逝场传感器。
Evanescent wave fiber-optic sensors (EWFS) with acicular encapsulation were fabricated using silicon photolithography technology and silica wet-etching technology.
无论最终的产品将是青铜，冷铸瓷彩涂雕像，或树脂套件，其雕刻工艺是相同的。
Whether the final product will be bronze, cold cast porcelain pre-painted statue, or resin kit, their sculpting process is the same.
其中有一半想立刻工作，他们需要工作。也许他们不能上大学，也许他们必须挣钱。
Half of them want jobs now. They need to work. Maybe they can't go to college. Maybe they have to earn money.
NVT 无堵塞立式泵应用于含有废水，泥浆，废料等介质的各种苛刻工况的领域。
NVP/NVT non-clogging vertical pumps are intended for all kinds of hard applications with waste water, slurries or waste stock.
在某些应用场合需要适应苛刻工作环境要求的高性能、高可靠性嵌入式图形发生器。
Some display and control systems need a kind of high performance, high reliability graphics generator, and it must work in rugged conditions.
唐震华20年厨艺生涯，不仅主理各色菜系，更擅长菜肴营养搭配，食品雕刻工艺；
With 20years of culinary career, he not only handles various cuisines, but also is good at nutrition match of the dishes, as wellas food carving craft.
聚氨酯独特的伸缩和压缩性能，为高压，强负载和苛刻工作环境的工业提供了解决方案。
The unique flex and compression properties of polyurethane provide industrial solutions for high-impact operations, intense load-bearing applications and harsh operating environments.
本发明的课题是提供在半导体装置制造的光刻工艺中使用的形成抗蚀剂下层膜的组合物。
The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
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