该工艺具有良好的可控性，解决了在厚基片上制作大口径衍射光学元件时残余光刻胶的去除问题。
The process was controllable and could be applied to strip the photoresist residual of diffractive optical element fabricated on the thick substrate.
该胶已在航天产品的红外光学系统和电子电气系统中得到应用。
The Thiokol has been used in space-borne infrared optical systems and electron-electrical systems.
本文研究单不晕镜和双胶不晕镜用于测绘与计量光学系统的设计理论和方法。
This paper investigates the design theories and methods ir applying the single and dual cement aplanats in the optical system used in surveying and metrology.
用于各类无胶类光学材料分条、复卷，比如扩散膜、被光膜。
Used for slitting and rewinding various kinds of non-adhesive optic materials such as diffuse film and so on.
介绍了连续微光学元件在光刻胶上的面形控制方法。
The method on profile - control of micro - optic element in photoresist was presented.
封装过程中，采用光学光敏胶紫外光照射下快速凝固法。
During encapsulation process, used optical photosensitive adhesive rapid solidification method under UV irradiation.
通过对光刻工艺过程的研究，可为较好地控制正性光刻胶面形，制作微机械、微光学器件提供了参考依据，对微浮雕结构的深刻蚀具有重要的指导意义。
We can better control the positive photoresist figure, provide a reference for making MEMS and MOEMS, it is of an important instructional significance for deep relief of micro structure.
文章提出了三种微光学元件光刻对焦方法，并用它们对北京化学试剂研究所生产的BP-218紫外正型光刻胶的分辨率进行了测试，得到了满意的结果。
The resolution of the BP-218 UV photo resist, which is produced in Beijing Institute of Chemical Reagents, was tested by these methods and a satisfactory result was got.
文章提出了三种微光学元件光刻对焦方法，并用它们对北京化学试剂研究所生产的BP-218紫外正型光刻胶的分辨率进行了测试，得到了满意的结果。
The resolution of the BP-218 UV photo resist, which is produced in Beijing Institute of Chemical Reagents, was tested by these methods and a satisfactory result was got.
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