另外，尼康光刻机业务也开始扭亏为盈。
这位分析师还表示：“尼康在LCD光刻机市场上仍保持强势地位。
据报道Intel正在使用这款光刻机开发其22nm节点制程逻辑芯片产品.目前尼康是Intel32nm制程芯片关键层制造用光刻设备的独家供应商。
The tool is reportedly being used for the development of Intel Corp.’s 22-nm logic node. With a different tool, Nikon was the sole lithography vendor for the critical layers at Intel’s 32-nm node.
尽管由于近期智能手机和平板电脑的风行令小尺寸LCD面板表现较为活跃，但尼康第三季度售出的18台LCD光刻机中仍有12台是面向大尺寸面板（7/8G）的产品。
Although small-size LCD capex has been robust recently for tablet and smart phone panels, 12 of the 18 units shipped were for large size (7/8G) panels.
晶圆处理系统是光刻机的重要组成子系统，其包含两个主要部分：晶圆传输系统和晶圆预对准系统。
The wafer processing system is an important subsystem of the lithography, which consists of a wafer transmission system and a wafer pre-alignment system.
根据光刻机和光刻胶特性，模拟了实际的光刻过程。
The actual lithographic process was simulated according to the process conditions, such as lithographic tools and the property of resist.
阐述高分辨力光刻机的图像对准系统的原理及实现过程。
The principle and implementation of high precision video based alignment system are described.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
实验结果表明该方法可以高精度、有效地获得投影光刻机像质校正灵敏矩阵。
Experiment results show that the image quality correction sensitive matrix can be obtained in situ by this method with a high accuracy.
介绍了一种基于线阵CCD的光刻机调焦调平系统，讨论了其检测和控制原理。
A focus and level system of stepper based on linear array CCD was introduced, its testing and controlling principles were discussed.
硅片调焦调平测量系统测试平台用于对光刻机硅片调焦调平测量系统的性能进行检测。
The Test Bench built for Wafer Focusing and Leveling Sensor is to measure and evaluate its performance.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
讨论了双面对准光刻机的底部对准原理，并着重介绍了图像处理在高精度光刻机中的应用。
This paper discusses the principle of bottom side alignment system on double-faced lithography, and mainly introduces the application of digital image processing in the system.
本文从最基本的角度出发，介绍了亚微米分步重复投影光刻机中的一项新的检测技术——基准校正技术。
A new detecting technique-correction technique for datum in submicron DSW is introduced from the basic point of view.
超精密气浮工件台系统是当前主流光刻机中的核心子系统，要求具有纳米级的重复定位精度和同步运动精度。
Stage system is one of the most important sub systems in a step and scanner, the accuracy of its positioning and synchronizing has reached nanometer level.
德国米铱公司提供的电容式位移传感器被用于以纳米级的精度校准芯片光刻机中镜片的位置，测量晶圆厚度等应用。
Capacitive sensors from Micro-Epsilon are used, among other things, for the positioning, displacement measurement and thickness measurement in the semiconductors area.
本文从投影光刻机的图形传递要求出发，导出投影光刻机各主要光学系统的具体要求，并讨论这些参数确定的局限性。
The specific parameters of main optical system are deduced from the requirement of pattern transfer for the projection aligner. The limit of these parameters is discussed.
随着光刻特征尺寸的不断减小，尤其是随着分辨力增强技术的使用，像质参数的原位检测已成为先进的投影光刻机中不可或缺的功能。
As feature size shrinks, especially with the use of resolution enhancement techniques, accurate measurement of image quality parameters in situ is indispensable for the lithographic tools.
相对于传统PID主从同步控制方法，同步偏差的移动平均差减小18.2%，移动标准差减小61.5%，可以保证光刻机的曝光效果。
Compared with the conventional PID masterslave control method, the move mean difference is reduced by 18.2% and the move standard deviation is reduced by 61.5%, and the exposure effect can be ensured.
相对于传统PID主从同步控制方法，同步偏差的移动平均差减小18.2%，移动标准差减小61.5%，可以保证光刻机的曝光效果。
Compared with the conventional PID masterslave control method, the move mean difference is reduced by 18.2% and the move standard deviation is reduced by 61.5%, and the exposure effect can be ensured.
应用推荐