E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
At last, the feasibility of fabricating light guide plate by double beam laser direct writing system is confirmed.
最后论证用双光束激光直写系统制作亚微米光栅型导光板的可行性。
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺，其模具的制造是目前面临的难点。
DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.
衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
While writing, beam with love and don't insert your own thoughts and, especially, doubts.
当你写下这些话的时候，散发你的爱，不要加入你自己的想法，特别是怀疑。
The principles and features of raster scan, the function of the pattern generator and the process of the electron beam writing on the substrate under the control system are also introduced.
介绍了图形发生器的作用及电子束在控制系统作用下在基片上描绘图形的过程。
The experimental results show that the decrease of the intensity ratio of writing to gating beam and the increase of the gating...
而增大记录光与门光束的光强比，可以提高双色记录灵敏度。
The experimental results show that the decrease of the intensity ratio of writing to gating beam and the increase of the gating...
而增大记录光与门光束的光强比，可以提高双色记录灵敏度。
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