The reactants are initially pumped vertically downward by the viscose drag force of the high speed rotating disk, and then are deflected to form a flow region that is parallel to the wafer carrier.
反应物在初始阶段因高速旋转盘的牵引力被竖直向下地泵入,然后偏斜形成一个与衬底片托盘平行的流动区域。
The reactants are initially pumped vertically downward by the viscose drag force of the high speed rotating disk, and then are deflected to form a flow region that is parallel to the wafer carrier.
反应物在初始阶段因高速旋转盘的牵引力被竖直向下地泵入,然后偏斜形成一个与衬底片托盘平行的流动区域。
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