The method also includes the step of transmitting at least one sub-frame associated with a second frame.
所述方法还包括传送至少一个与第二帧相关的子帧的步骤。
The method also includes performing a second implant process to implant additional dopant of the second type in the silicon layer.
该方法也包括执行第二注入工艺以便在硅层中注入附加的第二类型掺杂剂。
The method also includes encoding idle information on a second portion of subcarriers if it is determined that the symbol in not the active symbol.
所述方法还包含：如果确定所述符号并非所述活动符号，那么在第二部分副载波上对闲置信息进行编码。
The method also includes terminating main etch step when a predefined etch depth of at least 70 percent of thickness into silicon layer is achieved.
当达到对所述硅层的预先设定的蚀刻深度时，终止所述主蚀刻步骤，所述预先设定的蚀刻深度是所述硅层厚度的至少70％；
The method also includes issuing commands to the selected one of the non-volatile memory controller and the volatile memory via the Shared control signals.
该方法还包括通过共用控制信号发出指令到选定的非易失性存储器控制器和易失性存储器中的一个。
The method also includes blending the chemical reagent with the fly ash to treat the fly ash and transferring the treated fly ash to a work or disposal location.
所述方法还包括将化学试剂与粉煤灰混合以处理粉煤灰并且转送处理的粉煤灰至工作或处置场所。
The method also includes reading the PLD programming data from the data buffer, and transmitting the PLD programming data to a programming port on the PLD at a PLD programming speed.
该方法还包括从数据缓冲器读取PLD编程数据，以及以PLD编程速度将PLD编程数据发送到PLD上的编程端口。
The method also includes positioning the at least one measurement assembly on the stationary member to facilitate measurements of the clearance gap during operation of the rotary machine.
该方法还包括将至少一个测量组件定位在固定构件上，以有助于在转动机器的操作过程中进行间隙测量。
The method also includes positioning the at least one measurement assembly on the stationary member to facilitate measurements of the clearance gap during operation of the rotary machine.
该方法还包括将至少一个测量组件定位在固定构件上，以有助于在转动机器的操作过程中进行间隙测量。
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