The construction of the target holder was changed so as to keep no other materials included in target surface, thus improving the purity of the films prepared by arc discharge deposition.
通过对靶座结构的改变，使得靶面不再存在其他材质，由此提高了电弧离子镀膜膜层的纯度。
The construction of the target holder was changed so as to keep no other materials included in target surface, thus improving the purity of the films prepared by arc discharge deposition.
通过对靶座结构的改变，使得靶面不再存在其他材质，由此提高了电弧离子镀膜膜层的纯度。
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