Microcrystals of metallic copper were electrochemically deposited onto the surface of porous silicon films in the aqueous electrolyte of copper(II) chloride.
以氯化铜水溶液作电解液，在发光多孔硅薄膜表面上电沉积铜。
Microcrystals of metallic copper were electrochemically deposited onto the surface of porous silicon films in the aqueous electrolyte of copper(II) chloride.
以氯化铜水溶液作电解液，在发光多孔硅薄膜表面上电沉积铜。
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