ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
采用射频磁控溅射法沉积了CN薄膜，利用XPS, XRD, FTIR等测试手段研究了CN薄膜的成分和结构。
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
Using X-ray diffraction technique, the process of the crystal growth of metal ultrafine particles, which are prepared by sputtering method and deposited on the silica! Substrate, have been researched.
利用X -射线衍射技术对溅射沉积在非晶二氧化硅基底上的金属晶体超微粒的生长特性进行实验研究。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
The ion plating is a new technique combined vacuum evaporation plating with sputtering.
离子镀是真空蒸镀与溅射相结合的新工艺。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
The coatings deposited by magnetron sputtering technology have good corrosion and wear resistance. This technique shows optimistic development trend in the field of magnesium alloys surface treatment.
采用磁控溅射制备的合金表面膜层具有防腐蚀性能优异、耐磨性强等优点，其作为镁合金表面处理技术具有良好的发展趋势。
The coatings deposited by magnetron sputtering technology have good corrosion and wear resistance. This technique shows optimistic development trend in the field of magnesium alloys surface treatment.
采用磁控溅射制备的合金表面膜层具有防腐蚀性能优异、耐磨性强等优点，其作为镁合金表面处理技术具有良好的发展趋势。
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