The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.

本发明涉及一种高真空离子束溅镀靶材利用率增强装置。

youdao

The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.

本发明涉及一种高真空离子束溅镀靶材利用率增强装置。

youdao