All samples were prepared by rf magnetron sputtering method.
所有样品采用射频辅助磁控溅射方法制备。
The rich rare earth transition metal amorphous films were prepared by DC double target co sputtering method.
用直流共溅射方法制备了富稀土-过渡族金属非晶态合金薄膜。
We employ the magnetic sputtering method to deposit amorphous tungsten films and investigate their thermal annealing process.
对使用磁控溅射法沉积的钨薄膜进行了热退火研究。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
The invention relates to a magnetic confinement magnetron sputtering method and a magnetron sputtering device prepared by use of the same.
本发明涉及一种磁约束磁控溅射方法及利用该方法制备的磁控溅射装置。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
Reducing reflecting layer, transparent electrode, emitter and cathode in the LCD manufacturing technology are all carried out using sputtering method.
液晶显示器制造工艺中的降低反射层、透明电极、发射极与阴极等均由溅射方法形成。
Comparing with general sputtering method, this equipment has the advantages of decreasing the sputtering voltage and increasing the rate of deposition obviously.
与普通溅射方法相比，本设备的优点是：溅射电压大大降低，而淀积速率提高很多。
In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate.
特别是利用反应性溅射法，在低温下以高成膜速度进行堆积，得到非晶的氧化钛。
Comparing with the conventional electrochemical deposition, room temperature sputtering method, the platinum loading was dramatically lowed, which reduced the cost of the NDSC.
与常用的电镀法和室温溅射法相比，大幅度的降低了电极的载铂量，减小了电池的制作成本。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
Using X-ray diffraction technique, the process of the crystal growth of metal ultrafine particles, which are prepared by sputtering method and deposited on the silica! Substrate, have been researched.
利用X -射线衍射技术对溅射沉积在非晶二氧化硅基底上的金属晶体超微粒的生长特性进行实验研究。
Improving the parallel electrode method leads to decreasing sputtering loss and increasing collection ratio greatly.
提出了一种平行板静电场的改进方法，大大降低了溅射损失，提高了。
A method to predict the sputtering efficiency of a target is also described as well as a system for quantifying the texture homogeneity of a polycrystalline material.
还公开了一种用于预测一种目标的溅射效率的方法以及一种用于量化多晶物质的结构均匀性的系统。
Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.
用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。
Physical method, including thermal evaporation and magnetic sputtering, and chemical coating method are applied to prepare organic-inorganic composite chromotropic film.
用热蒸发和磁控溅射的物理镀膜方法和溶胶凝胶化学涂布的方法相结合制备了有机和无机复合纳米光学变色薄膜。
Compared with the pollution of the traditional plating or spray coating method to the environment, the vacuum sputtering is environmental process and accords with ROHS standard completely.
相对于传统水电镀或喷涂方式对环境的污染，真空溅射是环保制程，完全符合ROHS标准。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
The results show that compared with parallel electrode method, RF resonance method has advantages such as shorter extraction time, lower collision loss and sputtering loss and higher collection ratio;
模拟结果表明，RF共振法与平行板静电场法相比，引出时间较短，碰撞损失和溅射损失较低，收集率较高；
The method can be used not only for vacuum evaporation deposition, but also for sputtering deposition to prepare the thin-film.
它既能用于真空蒸发沉积，又可用于溅射沉积来制备薄膜。
Magnetron sputtering is common method for preparating metal film resistor. by this method, the target is very important for the performance of the resistor.
在金属膜电阻器的生产过程中，靶材是非常关键的，它制约著金属膜电阻器的精度、可靠性、 电阻温度系数等性能。
The paper has outlined the dispersion technology, sticking method and sputtering process for powder specimen studied by using SEM.
阐述了用扫描电镜研究粉末试样的分散技术、固定方法和镀膜技术。
High resistance AZO films are fabricated on quartz substrates by radiofrequency (RF) magnetron sputtering deposition method in the environment with high oxygen proportion.
在石英衬底上采用射频磁控溅射的方法制备高电阻azo薄膜，其中高电阻由高氧氩比环境得到。
A magnetron sputtering apparatus and a method for manufacturing thin film are provided.
提供了一种磁控溅射设备和薄膜制造方法。
Embodiments of the invention provide a method of welding sputtering target tiles to form a large sputtering target.
本发明提供一种焊接溅镀靶材以形成一大的溅镀靶材的方法。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
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