The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
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