A method detecting and measuring the intensity of spectrum from laser plasma soft X-ray source is presented.
提出了一种新的探测和测量激光等离子体软X射线源光谱强度的方法。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.
描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。
应用推荐