The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented.
报道了一种用电子束曝光的方法在绝缘体上硅的脊状光波导上制做布拉格光栅的技术。
This will simplify the designing of trapezoidal-cross-sectioned rib waveguides and increase the precision of practical device.
这一结论有利于简化梯形截面脊波导的设计，提高实际器件的精度。
This will simplify the designing of trapezoidal-cross-sectioned rib waveguides and increase the precision of practical device.
这一结论有利于简化梯形截面脊波导的设计，提高实际器件的精度。
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