The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information.
该方法包括检测该等离子室内的等离子参数和分析所得到的信息。
The wafer plasma processing chamber is configured to react the reactive radical with a species at a surface of a wafer disposed in the wafer plasma processing chamber.
晶片等离子体加工室的结构设置成使反应性自由基与放置在晶片等离子体加工室内的晶片表面上的物质反应。
A gas flow model with laser plasma as heat source was developed based on axial symmetric Euler equations in the laser propulsion rocket engine absorption chamber.
以轴对称非定常欧拉方程为基础，建立了激光推进火箭发动机吸收室内纯气相单组分、以激光等离子体为内热源的流场模型。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
To create plasma, they applied an oscillating (radio frequency) electric field to the gas using two disk-shaped electrodes located near the top and bottom of the chamber.
为了制造等离子体，他们还在容器上下两个表面安上了电极，加上了射频震荡电场。
An inductively coupled plasma antenna, which is installed on a center of the dielectric window, transfers radio frequency power from an RF power supply to the interior of the processing chamber.
感应耦合等离子体触角安装在介电窗上以便定位在介电窗的中心上，并且将来自射频电源的射频功率传输到加工室内部。
The spectrometer has been equipped with an axial plasma torch and a rotary spray chamber.
光谱仪配有端视等离子体炬和旋流雾室进样装置。
The plasma processing chamber includes a substrate support configured to receive a substrate.
该等离子处理室包括一个配置为容纳基片的基片支撑件。
In an exemplary embodiment, a plasma processing chamber is provided.
在一个示范性实施例中，提供一种等离子处理室。
The energy absorption by the working gas, the radiation loss from plasma and the effect of working-chamber shape on the laser-sustained plasma characteristics are considered.
研究中考虑了工质对激光能量的吸收与辐射热损失，以及吸收室形状对激光维持等离子体特性的影响。
A plasma generation arrangement configured to provide plasma downstream to a plasma processing chamber.
一种等离子生成装置，其配置为将等离子向下提供至等离子处理室。
It comprises transport of activated gas from a remote plasma source to an area in the chamber in a uniform way through at least two injection points on equivalent paths for the reactive species.
所述方法包括通过至少两个注射点且在用于反应性物质的等同路径上以均匀的方式将被活化的气体从远程等离子体源输送至所述室中的区域。
A method of fault detection for use in a plasma processing chamber is provided.
提供一种用于等离子处理室的失效检测方法。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
Then Optimus Prime contacts them that all the decepticons are underway to assault Cybertron and that they have to prevent the Decepticons from entering the plasma energy chamber.
接着，擎天柱大哥传来消息说霸天虎正在进攻塞伯特恩的途中，并要他们做好准备阻止霸天虎进入等离子能量室。
The method is based on generating a charged corona plasma which is then introduced into a vacuum chamber to deposit the biomaterial onto a biased substrate.
该方法的基础上产生的费用电晕等离子体然后放入真空室引入存款基板上有偏见的生物材料。
According to the purity requirement for Si powder, a cold plasma reaction chamber with long drop distance and high reaction rate is provided in the paper.
根据硅粉纯化的要求，提供了一种长落程和高反应速率的冷等离体反应器。
In another embodiment, a method is provided for depositing a uniform film on a large-area substrate in a plasma-processing chamber.
在另一实施例中，本发明是提供一种在等离子处理腔室中大面积基板上沉积均一膜的方法。
Plasma was instantly produced after the interaction between the air and the YAG laser pulse quadruple output in the interspace of parallel-plate electrodes in the vacuum chamber.
采用YAG脉冲激光的四倍频输出与两平行平面极板间空气相互作用产生等离子体。
In another embodiment, a plasma-processing chamber is adapted to create a neutral current bypass path that reduces electric current flow through a magnetic field-generating feature in the chamber.
在另一实施例中，一等离子处理腔室是适用以建立一中性电流分流路径，其可以减少电流，其中该电流是流动通过腔室中一产生磁场的特征结构。
In another embodiment, a plasma-processing chamber is adapted to create a neutral current bypass path that reduces electric current flow through a magnetic field-generating feature in the chamber.
在另一实施例中，一等离子处理腔室是适用以建立一中性电流分流路径，其可以减少电流，其中该电流是流动通过腔室中一产生磁场的特征结构。
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