Photoresist coating preparation and baking; Thin film preparation.
光刻胶的旋涂与烘烤，薄膜材料制备。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
The positive photoresist composition which is suitable for used in a resist coating method by a discharge nozzle system can be provided according to the invention.
根据本发明可提供能够适用于排出喷嘴式的抗蚀剂涂布法的正型光致抗蚀剂组合物。
The invention discloses a method for preparing an organic field effect tube by using active layer graph. The method comprises the following steps of: coating photoresist on an insulated substrate;
本发明公开了一种采用有源层图形化制备有机场效应晶体管的方法，包括：在绝缘衬底上涂敷光刻胶；
Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
本发明的涂料组合物可用作光致抗蚀剂的覆盖涂层，包括可用在浸渍平版印刷工艺中。
Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
本发明的涂料组合物可用作光致抗蚀剂的覆盖涂层，包括可用在浸渍平版印刷工艺中。
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