This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
The unsuitable carbonitriding process, internal oxidation, over deep depth of carbonitrided layer and crust like C N compound on the surface are the main reasons to cause fracture.
碳氮共渗工艺选择不当，共渗层过深，表面出现壳状碳氮化合物、内氧化等缺陷组织是造成其断裂的主要原因。
I did not know what the future held of marvel or surprise for me. [n] Anger and bitterness had preyed upon me continually for weeks and a deep languor had succeeded this passionate struggle.
至于我的未来究竟会出现什么样的奇迹，我茫然不知。几个星期来，愤怒和怨恨一直折磨着我。这种激烈的感情争斗之后则是一种极度的疲惫。
I did not know what the future held of marvel or surprise for me. [n] Anger and bitterness had preyed upon me continually for weeks and a deep languor had succeeded this passionate struggle.
至于我的未来究竟会出现什么样的奇迹，我茫然不知。几个星期来，愤怒和怨恨一直折磨着我。这种激烈的感情争斗之后则是一种极度的疲惫。
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