With different barrier width, barrier height, sub-well width, spacer width and n-doping concentration, the changes of DC characteristics of DBRTDs are observed and analyzed.
当势垒厚度、势垒高度、子阱厚度、间隔层厚度、掺杂浓度改变时，可以观察到DBRTD直流特性也随之改变。
Phosphine (PH3) is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping, ion implement and chemical vapor deposition (CVD) etc.
磷化氢(PH3)是一种重要的电子特气，主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
These n-type dopant concentrations can be achieved using neutron transmutation doping (NTD) techniques.
这些n型搀杂浓度能使用中子嬗变搀杂(ntd)技术来取得。
These n-type dopant concentrations can be achieved using neutron transmutation doping (NTD) techniques.
这些n型搀杂浓度能使用中子嬗变搀杂(ntd)技术来取得。
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