Chemical-Mechanical polish (CMP) - a process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing. It is used during the fabrication process.
化学-机械抛光(CMP) -平整和抛光晶圆片的工艺，采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。
Chemical-Mechanical % polish (CMP) - a process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing. It is used during the fabrication process.
化学-机械抛光(CMP) -平整和抛光晶圆片的工艺，采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。
The outer sheath of cables has high mechanical strength, good abrasion resistant and high polish degree.
电缆外护套机械强度高、耐磨性好，并且具有高光洁度。
The application of this method makes the polish efficiency several-dozen times higher than that of the conventional manual-mechanical one and, at the same time, makes the quality of...
应用该法使排针条的抛光效率比用传统的手工机械方法提高几十倍以上，产品质量有大幅度提高。
The application of this method makes the polish efficiency several-dozen times higher than that of the conventional manual-mechanical one and, at the same time, makes the quality of...
应用该法使排针条的抛光效率比用传统的手工机械方法提高几十倍以上，产品质量有大幅度提高。
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