All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
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