LOCOS is the mature technology, which is used widely for the isolation in semiconductor micron times.
硅的局域氧化工艺是一个非常成熟的工艺，在微米时代有着广泛的应用。
On the upper surface of the LOCOS regions (12.1, 12.2) are polysilicon tiles (14.1, 14.2), respectively.
所述LOCOS区(12.1、12.2)的上表面上分别是多晶硅瓦片(14.1、14.2)。
One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.
关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。
One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.
关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。
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