The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
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