The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
电子束曝光机的偏转系统控制电子束偏转扫描。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
The tool is reportedly being used for the development of Intel Corp.’s 22-nm logic node. With a different tool, Nikon was the sole lithography vendor for the critical layers at Intel’s 32-nm node.
据报道Intel正在使用这款光刻机开发其22nm节点制程逻辑芯片产品.目前尼康是Intel32nm制程芯片关键层制造用光刻设备的独家供应商。
EDM tool electrode with high aspect ratio is produced successfully by combining deep lithography with electroforming.
采用深度光刻与电铸技术相结合的方法，较好地解决了大深宽比的电火花工具电极的制造问题。
EDM tool electrode with high aspect ratio is produced successfully by combining deep lithography with electroforming.
采用深度光刻与电铸技术相结合的方法，较好地解决了大深宽比的电火花工具电极的制造问题。
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