In this paper, Focused Ion Beam Lithography technology and is introduced.
对聚焦离子束曝光技术作了介绍。
Fabrication of nanostructures is an important part of nanotechnology, and atom lithography technology is a new nanostructure fabrication method.
纳米结构制作是纳米技术的重要组成部分，原子光刻技术是纳米图形制作的一项新方法。
Microfabrication of periodic structures by holographic lithography technology combining with visible laser-induce photopolymerization is developed in this paper.
本文报道用激光全息技术结合可见光光聚合制作周期结构的方法和物理机制；
By pressing, nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution, high efficiency and low cost.
纳米压印技术通过压印实现了纳米结构的图形转移，具有分辨率高、效率高、成本低的优点。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
纳米压印作为非光学的下一代光刻技术，具有分辨率高、成本低、产率高等诸多优点，因而可能应用于将来的半导体制造中。
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
As a newly coming micro fabrication technology, soft lithography use elastomeric stamp to replace hard stamp in traditional lithography to fabricate micro patterns and structures.
作为一种新型的微图形复制技术，软光刻技术用弹性模替代传统光刻技术中使用的硬模来产生微形状和微结构。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
Triple resist technology which can pattern submicron patterns has been developed and used to fabricate submicron IC's successfully depending upon the native lithography equipment.
在现有国产光刻设备的基础上，研制成功了能够复印出亚微米图形的三层胶工艺，并用于制作亚微米电路。
For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
针对纳米压印光刻技术中压印脱模后的留膜去除问题，提出了一种基于光刻版的无留膜紫外纳米压印技术。
Exposure technology is presently on its way to become an advanced impulse for the development of lithography.
并对这些光刻曝光技术进行相应的比较。
Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
The method and the principle of manufacturing micro-machines by sacrificing layer technology together with 3-d lithography is discussed also.
同时还介绍了立体光刻技术结合抗腐蚀层、牺牲层工艺加工微器件的原理、方法和应用。
Processes of SU-8 photoresist mold and polymer elastomeric stamp were researched in order to solve the technology of the key part—elastomeric stamp in the soft-lithography.
为了解决软光刻技术中核心元件弹性印章的制备技术，对SU-8胶印模和聚合物弹性印章进行了工艺研究。
The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
制备金属光子晶体方法包括：电子束刻蚀结合后续剥离法、激光干涉光刻结合干刻蚀技术等。
Some polymer materials are used as substrate. Kinds of new microfabrication technology are presented, including lithography, soft etching, LIGA, DEM and bonding, etc.
系统介绍了芯片实验室的各种制备技术，这些技术包括紫外光刻、软刻蚀、LIGA技术、DEM技术、键合等。
To improve the fabrication technology of photoelectrical encoder, the laser lithography method was introduced.
为了改进光电码盘的制作工艺，提高效率，降低成本，提出了一种光电码盘的光刻方法。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
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