A method of simulating and optimizing lithographic process parameters is proposed based on the concept of effective time difference.
通过引入有效时差的概念，提出了一种可模拟光刻工艺参数间的相互关系及优化光刻参数的方法。
The actual lithographic process was simulated according to the process conditions, such as lithographic tools and the property of resist.
根据光刻机和光刻胶特性，模拟了实际的光刻过程。
Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device.
本发明的课题是提供在半导体装置制造的光刻工艺中使用的形成抗蚀剂下层膜的组合物。
The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device.
本发明的课题是提供在半导体装置制造的光刻工艺中使用的形成抗蚀剂下层膜的组合物。
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