The distribution of the extraction apertures is made to compensate the Gaussan of the ion beam current density.
使引出孔的分布补偿束电流密度的高斯分布。使参数匹配并实行程序控制。
In a four-electrode system, changing the electric field ration only slightly changes the ion beam current at a certain beam energy.
在四电极系统中在一定束能量下改变电场强度比仅轻微地改变束电流。
The invention provides an ion pipe with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform.
本发明提供一种排列有多个离子束引出孔的离子管，使得离子束电流密度变得均匀。
At a certain electric field ratio, five electrode, systems could be used to change the ion beam current and the beam energy to a certain extent.
在一定电场强度比下可以用五电极系统在一定范围内改变束电流或束能量。
After the connections are made, verify the system is working properly by turning the bias voltage on and taking a current measurement with no ion beam current.
完成电路连接之后，接通偏置电压，在没有离子束电流的情况下进行电流测量，以验证系统能够正常工作。
The invention provides an ion pipe and ion beam extraction method, wherein the ion pipe is arranged with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform.
本发明提供一种离子管及离子束的引出方法，离子管排列有多个离子束引出孔，使得离子束电流密度变得均匀。
Low current measurement applications include capacitor leakage, low current semiconductor, light, and ion beam measurements.
弱电流测量的各种应用包括电容器的漏电、弱电流半导体、光和离子束测量等。
A numerical method simulating high current ion sources for neutral beam injection is given in this paper as well as its typical result.
本文叙述了中性束注入器中的强流离子源引出系统离子束光学性质的数值模拟方法，并给出了典型计算结果。
The intensity of a pulsed beam of charged particles in the Cooling Storage Ring Project of Heavy Ion Research Facility in Lanzhou (HIRFL-CSR) will be measured with a toroidal current transformer.
兰州重离子加速器冷却储存环工程(HIRFL CSR)主环和实验环上带电粒子束流强度的测量和监视拟由环型束流变压器实现。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
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