Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
With the development of semiconductor process technology, nowadays a system on a PCB (Printed Circuit Board) which is composed of several ICs can be integrated into a chip.
随着集成电路制造工艺的飞速发展，人们已经可以将原先用各种电路搭建的板极系统集成在一块芯片上。
With the development of semiconductor process technology a system on a PCB (Printed Circuit Board) which is composed of several ICs can be integrated into a chip.
随着集成电路工艺的飞速发展，人们已经可以将原先的板级系统集成在一块芯片上，系统芯片逐渐成为集成电路设计的主流发展趋势。
Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
And it is a type of integrated circuit produced by CMOS technology, which can process digital -analog mix signals.
它是采用CMOS工艺制成的数字-模拟混合信号处理集成电路，是一种颇具发展前景的新型电子器件。
And it is a type of integrated circuit produced by CMOS technology, which can process digital -analog mix signals.
它是采用CMOS工艺制成的数字-模拟混合信号处理集成电路，是一种颇具发展前景的新型电子器件。
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