With air-formed films the faradaic processes decreased progressively to a constant rate consistent with the increase in potential, indicating the healing of surface flaws.
对于空气氧化膜，电化学反应速度逐步变慢，直至达到相应于稳定钝态的恒定值，同时电位向正移动，表明膜中的微裂纹不断得到修补。
With air-formed films the faradaic processes decreased progressively to a constant rate consistent with the increase in potential, indicating the healing of surface flaws.
对于空气氧化膜，电化学反应速度逐步变慢，直至达到相应于稳定钝态的恒定值，同时电位向正移动，表明膜中的微裂纹不断得到修补。
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