The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
High voltage pulsed electrodeless discharge in rare gases can be used as a light source for laser excitation.
高电压无电极强脉冲气体放电，可以用作激光器的激发光源。
High voltage pulsed electrodeless discharge in rare gases can be used as a light source for laser excitation.
高电压无电极强脉冲气体放电，可以用作激光器的激发光源。
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