When a nitrogen atom sits next to a vacant spot in the carbon crystal, the intruding element provides an extra electron that moves into the hole.
当氮原子与碳晶体中的空心点相邻时，氮元素会产生特定的电子，这些电子可以移动到那个空心点里。
The spot distortion flaw on the surface of the float glass has been studied, Using the JCXA-733-type electron microprobe.
借助JCXA- 733型电子探针仪对浮法玻璃表面呈现的光畸变点缺陷进行了研究。
Methods the spatial distribution of the compositional elements in incipient enamel caries was obtained by spot selection, line and map analyses with electron probe microanalysis technique (EPMA).
方法应用电子探针微区分析(EPMA)技术对初期釉质龋中化学成分的空间分布进行选定微区、线扫描及面扫描分析。
During the welding process, the computer will modify the position of the electron gun based on the deviation to make the electron beam spot centered on the annular weld groove.
在焊接时利用处理后的偏差值在圆形焊缝相应位置不断修正电子枪的位置，从而达到电子束束斑与焊缝自动对中的目的。
The surface topography and composition of normal coating and spot were investigated by scanning electron microscope and energy dispersion spectrum.
采用扫描电镜结合能谱的测试方法，对热处理前后含铬绝缘涂层中正常涂层和斑点的表面形貌及成分进行了分析。
An online beam spot diagnostic system for high current, short pulse electron beam based on Cerenkov radiation is introduced.
介绍了一套基于切伦科夫辐射的用于强流短脉冲电子束束斑实时测量的装置。
This paper describes two microcomputer programs of electron diffraction spot patterns.
本文介绍了两种电子衍射花样的微型机分析程序。
Under the different laser parameters, the electron energy gain depends on the laser intensity, focal spot size and pulse width.
不同激光参鼍条件下，得到了电子的能量增益与激光强度、焦斑大小和脉冲宽度关系。
The metalurgraphic and electron microscopic inspection found that the black spot defects are formed by the oxidation of particle enriched zone.
结果表明，该缺陷与强化相析出有关，金相与电镜观察证明，该区域是析出质点富集区经氧化形成的。
The highest speed of the irradiation bed can be determined by the frequency of modulator, scanning width, and the size of electron beam spot...
根据速调管调制器主振脉冲频率、扫描宽度和电子束的束斑大小可以定出辐照床的最高运动速度以实现高效率的辐照。
Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
此外，栅格大小与制造设计掩模的最小化电子束点大小成比例。
Additionally, the grid size is proportional to the minimum electron-beam-spot size used to create the masks for the design.
此外，栅格大小与制造设计掩模的最小化电子束点大小成比例。
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