• A spacer (23) is formed on only the drain side of the electrode.

    只在该栅电极的漏侧形成一个隔层(23)。

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  • The expression of the electrostatic force which drives the island considers the function of the gate electrodes and the initial capacitances besides the effect of the drain-source electrode.

    在岛区受到的静电力的表达式中,除了包括漏源电极的作用外,还考虑了双栅电极和系统初始电容值的影响。

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  • As a switching device, TFT in AMLCD operates in saturation mode. Its source contact is always connected to the data bus (video), and the drain to the pixel electrode.

    作为开关器件,AMLCD中的TFT工作在饱和模式,其源极总是连接数据总线(视频),漏极接像素电极。

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  • A source region and a drain region are formed in the fin at the opposite sides of the gate electrode.

    源区和漏区形成在鳍部内栅极的相对侧处。

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  • The high-voltage capacitor structure comprises a two-step diffusion drain electrode structural layer, an oxide layer and a polycrystalline silicon layer.

    高压电容结构包括双重扩散漏极结构层、氧化层及多晶硅层。

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  • The oxide layer is formed on the two-step diffusion drain electrode structural layer and completely superposed on the two-step diffusion drain electrode structural layer.

    氧化层是形成于双重扩散漏极结构层上,且氧化层完全重叠于双重扩散漏极结构层上。

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  • The virtual storage unit line comprises a second conduction type source electrode region and a second conduction type drain electrode region.

    虚拟存储单元行包括第二导电型源极区和第二导电型漏极区。

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  • The two-step diffusion drain electrode structural layer is used for serving as a lower electrode plate of a high-voltage capacitor.

    双重扩散漏极结构层用以作为一高压电容的下电极板。

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  • The two-step diffusion drain electrode structural layer is used for serving as a lower electrode plate of a high-voltage capacitor.

    双重扩散漏极结构层用以作为一高压电容的下电极板。

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