E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
Sea Bat 7125-e - High resolution multi beam sonar, the S410 Deepwater hydrographic and broadband echosounder, and the PDS2000 Software package.
“海上蝙蝠”(Sean Bat) 7125-E高精度多波束声纳，S410深水水道测量和宽带回波器，PDS2000软件包。
The long pulse electron beam system reported here was constructed for transverse pumping and e-beam sustained discharge large energy gas laser.
本文介绍的长脉冲大面积强流电子束系统是为横向泵浦和控制放电泵浦大能量气体激光而设计和研制的。
The results demonstrate that dynamic e-beam evaporation technology is an effective method for preparing excellent ITO transparent conducting film.
实验结果和理论分析表明，动态变化的电子束蒸发工艺是制备优质ito透明导电膜的有效方法。
This paper presents a kind of data conversion software used in the variable-shaped e-beam lithography, especially on its composition, working theory and working procedure.
本文简要介绍了一种矩形电子束曝光机图形转换软件的结构、工作原理和工作过程。
The paper studies nonlinear F. E. analysis of stiffened shells, presenting beam element to simulate the stiffeners.
本文研究了加劲壳的非线性有限元分析方法，提出了一种梁元素来模拟加筋。
Individual sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.
利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件。
A compact output switch for a water pulse forming line (PFL) e-beam accelerator was designed.
介绍了一种水介质脉冲形成线强流电子束加速器的输出开关的设计和实验结果。
There are mainly three methods in the second system stress analysis of the orthotropic steel deck, P-E method, the equivalent girder beam method and the FEM.
薄壁钢扁平箱梁正交异性板钢桥面系第二体系应力的计算方法主要有P -E法、等效格子梁法和有限元法等。
The process of nonlinear distortion correction of orthogonal pattern group in E-beam scanning is introduced.
论述了电子束扫描正交图形簇产生畸变的非线性校正过程。
This paper describes the aberration and distortion of e-beam deflection magnetic field in which the parameters keep close to in the normal solution.
以电子束偏转磁场的像差和畸变为目标，对参量进行非劣解中找出贴近理想的最优解。
The development and experiments of electronic controlling system for variable rectangular E-beam lithography and lasser positioning stage are summed in the paper.
本文总结了用于可变矩形电子束曝光机激光定位工件台电控系统的研制及实验经验。
The proximity effect in the E-beam lithography system was verified by experiments.
利用电子束曝光机完成有关邻近效应的实验。
The high speed Patten Generator is designed for nanometer E-beam lithography system.
为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
Thee-beam peak current is 7A measured behind a 6mm diameter e-beam window. The pulse duration (FWHM) is 6-8ns and the maximum electron energy is about 107keV.
在直径为6毫米的电子枪窗口后测得电子束峰值电流为7安，脉冲的半峰宽为6～8毫微秒，最大电子能量约为107千电子伏特。
The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
利用SDS - 3电子束曝光机完成有关邻近效应的试验。
Then the finite element method is introduced for the elastic slider-crank mechanism, i. e. how to make the dynamics model of an elastic beam element by using the finite element method.
同时针对弹性机构而言，介绍了有限单元法。主要说明如何对弹性梁单元进行有限元建模。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
But if we wereto go next door and use a reactive sputterer instead of this e-beam evaporator, we could easily get a coating that forms to the surface, and you wouldn't seeany differences.
但是如果我们利用反射性溅射反应器代替电子束发生器，我们可以很容易的在物体的表面得到这种涂层，你不会看到任何的差异。
A U-shape patch element for phased array antennas with wide-beam both in E-and H-planes is presented in this paper.
该文介绍了一种在E面和H面都具有宽波束特性的U形贴片相控阵天线单元。
The amount of light in the reflected light beam (L2) or an optical, e. g. luminescence response is then detected by a light detector (31).
然后由光检测器(31)检测反射光束(L2)或光学，例如发光响应中的光量。
U-shape patch element for phased array antennas with wide-beam both in E-and H-planes is presented in this paper.
该文介绍了一种在E面和H面都具有宽波束特性的U形贴片相控阵天线单元。
The equations of nonlinear viscouselastic beam are considered, The existence of absorbing set and inertial manifolds for the system are obtained, and from which we get that the P D E.
考虑具有介质阻尼及非线性粘弹性本构关系的梁方程，证明了它的有界吸收集和有限维惯性流形的存在性，并由此得到在一定的条件下所给偏微分方程等价于一常微分方程组的初值问题。
The equations of nonlinear viscouselastic beam are considered, The existence of absorbing set and inertial manifolds for the system are obtained, and from which we get that the P D E.
考虑具有介质阻尼及非线性粘弹性本构关系的梁方程，证明了它的有界吸收集和有限维惯性流形的存在性，并由此得到在一定的条件下所给偏微分方程等价于一常微分方程组的初值问题。
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