This detector line array is fabricated using 2 micron design rule and a double level poly silicon structure.

器件采用最小2微米设计规则，两层多晶硅结构。

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This paper presents a double-level registration method which includes a rough registration and a precise registration.

提出了具有各形状通用性的包括粗略配准及精确配准的双层印鉴配准方法。

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This paper presents a double-level registration method which includes a rough registration and a precise registration.

提出了具有各形状通用性的包括粗略配准及精确配准的双层印鉴配准方法。

youdao