1800 relative rotation between the diffraction pattern and micrograph that would not be detectable in the double exposure technique illustrated in fig. l. 3.
图表1。3所示的双曝光技术中对于衍射模型和显微图并没有表示出来，这个倒置，就在衍射模型和显微图之间形成了一个额外的1800相关旋转。
1800 relative rotation between the diffraction pattern and micrograph that would not be detectable in the double exposure technique illustrated in fig. l. 3.
图表1。3所示的双曝光技术中对于衍射模型和显微图并没有表示出来，这个倒置，就在衍射模型和显微图之间形成了一个额外的1800相关旋转。
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