The common fabrication technologies of binary optical elements were expatiated, including etching, thin-film deposition, direct writing, excimer laser projection and gray-scale masks.
综述了二元光学元件的常用制作工艺技术，包括台阶刻蚀法、薄膜沉积法、直接写入法、准分子激光加工法和灰阶掩模法。
It's part of Baume concentration is very important in the etching, a direct impact on the speed of etching.
它的波美浓度在蚀刻环节中非常重要，直接影响到蚀刻的速度。
Some binary optical elements were manufactured by parallel direct writing and inductive couple plasma etching technology.
利用并行直写技术与感应耦合等离子刻蚀技术制作了部分二元光学元件。
Some binary optical elements were manufactured by parallel direct writing and inductive couple plasma etching technology.
利用并行直写技术与感应耦合等离子刻蚀技术制作了部分二元光学元件。
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